- ModelATOM1000L
- Gas Process MethodPLASMA WET
- Processing capacity600LPM
- Dimension(Cabinet)1300(W)X1200(D)X1800(H)
주메뉴
- ATOM1000L
- Plasma-Wet Scrubber responding to Display CVD processing
- ATOM1000L
- It is an equipment that purifies Toxic Gas such as semiconductor, LCD, OLED, solar Cell
in the course of production process and emits them.
Product Features
- High Temperature Heat Equilibrium Plasma
- Specialized in bulk LCD CVD processing
- Scraper System : Prevention of Powder Clogging
- PFCs GAS Processing Unit using high-temperature Plasma ARC, not the second heat source(LNG, LPG, etc.)
Possible processing GAS
- PFC GAS : NF3, SF6, ETC
- Flammable GAS : SiH4, DCS, TEOS, H2, PH3, ETC
- Water-Soluble GAS : Cl2, HF, HCl, NH3, ETC
